Mathematical Model and Numerical Schemes for Industrial Applications of Rarefied Plasma Analysis
| Reference No. | 2023a022 |
|---|---|
| Type/Category | Grant for General Research-Short-term Joint Research |
| Title of Research Project | Mathematical Model and Numerical Schemes for Industrial Applications of Rarefied Plasma Analysis |
| Principal Investigator | Rei Kawashima（Department of Electrical Engineering, Shibaura Institute of Technology / Associate Professor） |
| Research Period |
October 31, 2023. - November 02, 2023. |
| Keyword(s) of Research Fields | Plasma process, Ion engine, Plasma simulation, Anisotropic diffusion problem, Mixed finite volume method, Discontinuous Galerkin method |
| Abstract for Research Report | Rarefied plasma flow appears in various plasma applications, such as semiconductor manufacturing, plasma processing, and space electric propulsion. Magnetic fields are commonly used to control the plasma flow in these devices. However, accurate prediction of the plasma flow control is challenging. It is known that magnetized plasma flows are generally described by anisotropic diffusion problems, which can be difficult to simulate without numerical oscillations. In the field of mathematics, researchers have studied this issue for decades and proposed various approaches, including hyperbolic equation systems and discontinuous Galerkin methods. Although these approaches have demonstrated advantages in simplified test cases, they are rarely applied in practical numerical simulations for industrial applications. The objective of this research project is to examine the governing equations of plasma flow and propose an advanced approach for practical use, including mathematical model and numerical schemes. This year, our focus is on the anisotropic diffusion problems. We plan to extend the aforementioned hyperbolic system scheme or discontinuous Galerkin method for analyzing semiconductor manufacturing devices and ion engines. Upon completion of this study, we anticipate that the combination of mathematical model and numerical schemes developed will become the new standard in rarefied plasma flow analysis in semiconductor manufacturing and electric propulsion. In addition to contributing to the development of devices and the investigation of plasma physics, we expect that research in applied mathematics will become more active in the field of industrial plasma technology. |
| Organizing Committee Members (Workshop) Participants (Short-term Joint Usage) |
Daisuke Tagami（Institute of Mathematics for Industry, Kyushu University / Associate Professor） Chamarthi Amareshwara Sainadh（Faculty of Mechanical Engineering, Israel Institute of Technology / Postdoctoral Researcher） Tatsuya Sodekoda（Corporate Research and Development, IHI Corporation / Project General Manager） Naoji Yamamoto（Department of Advanced Energy Science and Engineering, Kyushu University / Professor） |